IIT Mandi researchers develop anti-bacterial, self-cleaning material for face masks and PPE equipment
India Today
IIT Mandi latest research: The developed nanomaterial can clean the mask by simply keeping it in bright sunlight and make it ready to wear again.
Indian Institute of Technology Mandi researchers has developed a virus-filtering, self-cleaning and antibacterial material that can be used to make face masks and other PPE equipment. This path-breaking development of Dr Amit Jaiswal, Assistant Professor, School of Basic Sciences, IIT Mandi, along with his research scholars, Mr Praveen Kumar, Mr Shounak Roy, and Ms Ankita Sarkar comes at a time in which it has become imperative to develop techniques to stop the second wave of the Covid-19 pandemic in the country. Results of this work have recently been published in the prestigious journal of the American Chemical Society — Applied Materials and Interfaces.More Related News